Leads lithography process development for quantum qubit manufacturing, owning the wet process stack, optimizing beam-resist interactions, and driving roadmap from R&D to production. Requires PhD with 7+ years or MS with 10+ years in lithography, hands-on expertise in tools and statistical analysis.
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About the role
Required Qualifications
Ph.D. with 7+ years or M.S. with 10+ years of direct experience in lithography process development and integration.
Degree in Physics, Materials Science, Electrical Engineering, Chemical Engineering, or a related field.
Proven hands-on mastery of the full lithography "wet" stack, including CAR/non-CAR resist chemistry, reaction kinetics, CD control, and sub-micron overlay management.
Strong expertise in SPC, DOE, GR&R, and root-cause analysis; proficiency with JMP or similar statistical software to build diagnostic frameworks from the ground up.
Proven ability to professionalize processes in R&D or semi-manual environments, translating "tribal knowledge" into scalable SOPs, recipes, and technical specifications.
Hands-on proficiency with track systems, projection steppers, contact aligners, and maskless aligners (MLA).
Ability to build process frameworks and drive technical strategy rather than just executing within existing ones.
Demonstrated ability to manage ambiguity, prioritize module-level goals, and mentor junior engineering staff while maintaining deep hands-on technical engagement.
Comfortable working in cleanroom environments (HAZMAT and ESD protocols).
Highly Desired Experience
Experience partnering with E-beam hardware specialists to optimize the resist/process interface.
Technical knowledge of proximity effect correction (PEC), dose strategy optimization, and multi-layer resist stacks.
Expertise in managing charging and thermal stability challenges on non-standard or insulating substrates.
Direct experience with DUV (KrF/ArF) or i-line projection lithography and the transition of processes to high-throughput production.
Experience with ultrasonic spray-coating systems and lithography on high-topology or 3D surfaces.
Proven success developing hybrid optical + e-beam workflows to ensure chemical compatibility and sub-50nm alignment precision.
Prior experience in Quantum, MEMS, or Photonics fabrication environments.
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